Model-based infrared technology
Model-based infrared technology
Using model-based infrared technology, Semilab AMS provides precise measurements of the thickness and uniformity of dielectric layers and etched structures used in IC manufacture. The MBIR technology is particularly useful for metrology challenges in DRAM, power device and stacked interconnect fabrication, where high-aspect-ratio trench structures have become a staple of the manufacturing process.
The Semilab AMS model-based infrared reflectometry metrology family include the IR3000, IR3100, IR3100N, and IR3100S.