WT-2000
The WT-2000 is a powerful tabletop measurement platform for performing many different semiconductor material characterization measurements. The base system includes all the overhead functions necessary to perform characterization measurements, including power supplies, computer and operating software, XY measurement stage, etc. Each system is then configured to the user’s requirements by adding measurement capabilities and automation capabilities described below.
Measurement capabilities:
- µ-PCD for measuring carrier lifetime
- SPV for measuring diffusion length
- VQ for oxide monitoring
- JPV for measuring ion implants
Automation capabilities:
- 100-200mm cassette indexer
- 300mm 13-slot cassette indexer, including open cassettes for 100-300mm wafers
- 300mm 25-slot cassette indexer, including FOUP, FOSB, and open cassettes for 100-300mm wafers
The WT-2000 is typically used to make maps, where the wafer is scanned at a programmable raster. The WT-2000 can also perform measurements at specific, programmable measurement locations.
Specifications:
- measurement technique:
- µ-PCD (lifetime);
- SPV (diffusion length)
- VQ (oxide monitoring)
- JPV (ion implants)
- sample size:
- Wafers: from 100x100 mm to 300x300 mm
- loading: manual or automatic
- resolution in X-Y mapping: 16,8,4,2,1 mm or 500, 250, 125 or 62.5 µm.
- µ-PCD lifetime:
- sample resistivity range: 0.1 to 1000Wcm
- sample lifetime range: 10 ns - 1 ms
- lateral resolution: 1 mm
- SPV diffusion length：
- n- and p-type, non-oxidized, oxidized and patterned silicon wafer measurements
- Sample surface has to be in depletion
- Sample resistivity: down to 0.01Ωcm
- lateral resolution: 8 mm (or optional 3 mm)
Applications:
- Contamination Monitoring
- Dielectric Characterization
- Epi Layer Monitoring
- Ion Implant Monitoring