SSM 495 System
The SSM 495 CV Measurement System provides automatic mapping and a variety of electrical characterization measurements for non-patterned wafers used in epitaxial silicon and front-end semiconductor process development and production. Measurements performed include Schottky Diode and MOS CV.
The SSM 495 eliminates the need for costly metal and poly deposition processes by using a pneumatically controlled, non-damaging probe design and a top-side mercury contact. With separate probe and chuck vacuum lines, the system features an extremely stable contact area and uses only a small quantity of mercury to make highly repeatable measurements for process development and process monitoring applications.
Typical SSM 495 applications
- EPI resistivity
- Low-k dielectric constant
- Oxide integrity
- Thin film read-heads
- Flat panel displays
Specifications:
- Wafer diameter from 75 mm to 200 mm
- Single-site and multiple-site maps
- Face-up site loading prevents wafer damage
- Precision pressure regulators for Hg contact
- PROCAP software provides a full suite of measurements
Applications:
Dielectric Characterization
Epi Layer Monitoring