Epimet-300
Epimet delivers the industry’s first realtime, non-contact method to measure epi layer resistivity profiles in production. Fast feedback and the availability of resistivity profile plots and wafer maps aid in troubleshooting for still higher control over epi processes.
Three models of Epimet systems provide 100% non-contact, non-destructive measurements of epi layer resistivity via patented technology. The physics behind the measurement is quite similar to CV Schottky or Hg-probe, and thus the output is a traditional CV doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.
All models include complete automation, powerful software, and excellent measurement repeatability.
Epimet was originally developed by SemiTest, and Semilab continues to sell, support, and improve the product.
Specifications：
|
Epimet Model |
Usage |
|
Model 2 |
Medium volume production of wafers up to and including 200mm |
|
Model 2DC |
High volume production of wafers up to and including 200mm |
|
300 |
High volume production of 300mm wafers |
FEATURES:
- Accurate profiles of epi layer resistivity
- Completely non-destructive
- No monitor wafers
- Treatment before the measurement is completely integrated
- Excellent 1% repeatability between 1-100Wcm
Applications:
Epi Layer Monitoring
Technologies:
Epi Layer Resistivity