7300RC
The 7300RC, our proprietary Epi monitoring tool, measures wafer resistivity using an advanced surface photo-voltage technology. This provides non-contact, non-destructive measurement of production wafers, either pre-shipment or during incoming inspection. The 7300RC measures 200mm and 300mm wafers and can be used for both N-type and P-type wafers (Epi and CZ). Full wafer mapping, diameter scans, histogram and point pattern analysis are available in the software package. Semilab QC provides the expertise, commitment and support to help you customize your system utilization for your specific monitor application.
Specifications:
- Non-destructive and non-contact measurement technique
- Capable of measuring N and P-type wafers
- Epi Layers; P/N, P/P, N/N, N/P, etc.
- Czochralski (CZ) substrate
- Inert gas anneal for epi production
- Measurement of thin epi layers, > 0.1 microns
- High resolution wafer mapping at >1900 points per wafer
- Resistivity range - 0.01 to 500 ohm-cm
- Throughput - typically 6 to 9 wafers per hour (300mm and 200mm)
- Repeatability
- 1.0% - 1 sigma for 0.01 to 1 ohm-cm
- 1.5% - 1 sigma for >1 to 10 ohm-cm
- 2.0% - 1 sigma for >10 to 300 ohm-cm
Applications:
Epi Layer Monitoring